- 2D Crystal Materials
- 2D CVD Materials
-
2D MAXENE MXENE
-
MAXenes
- (Mo2/3Sc1/3)2AlC MAX
- (Mo2/3Y1/3)2AlC MAX
- (W2/3Sc1/3)2AlC MAX
- (W2/3Y1/3)2AlC MAX
- Cr2AlC MAX
- Cr2TiAlC3 MAX
- High Entropy MAX
- MAX Target Material
- Mn2AlC MAX
- Mo2Ga2C MAX
- Mo2Ti2AlC MAX
- Mo2Ti2AlC3 MAX
- Mo2TiAlC2 MAX
- Mo3AlC2 MAX
- MoAlB MAX
- Nb2AlC MAX
- Nb4AlC3 MAX
- ScAl3C3 MAX
- Ta2AlC MAX
- Ta4AlC3 MAX
- Ti2AlC MAX
- Ti2AlN MAX
- Ti2SnC MAX
- Ti2VAlC2 MAX
- Ti3Al0.5Cu0.5C2 MAX
- Ti3AlC2 MAX
- Ti3AlCN MAX
- Ti3GeC2 MAX
- Ti3SiC2 MAX
- Ti3SnC2 MAX
- Ti4AlN3 MAX
- TiNbAlC MAX
- TiVAlC MAX
- V2AlC MAX
- V2AlN MAX
- V2GaC MAX
- V2GeC MAX
- V2PC MAX
- V2ZnC MAX
- V4AlC3 MAX
- VCrAIC MAX
-
MXenes
- Amino Carboxylated MXene
- Cr2C MXene
- Element Doping MXene
- Foam Metal Load MXene
- High Entropy MXene
- In-situ Doped MXene
- Mo1.33C MXene
- Mo2C MXene
- Mo2Ti2C2 Mxene
- Mo2Ti2C3 Mxene
- MXene Film and Heterojunction
- MXene Functional Group Regulation
- MXene Loaded Metal
- Mxene Nanowire
- MXene Quantum Dots
- Nb2C MXene
- Nb4C3 MXene
- Other MXene Products
- Porous MXene
- Single Atom Doped MXene
- Solid Solution Phase MXene
- Ta2C MXene
- Ta4C3 MXene
- Ti2C MXene
- Ti2N Mxene
- Ti3C2 MXene
- Ti3CN MXene
- Ti4N3 MXene
- TiNbC MXene
- TiVC MXene
- V2C MXene
- V4C3 MXene
- VCrC MXene
- W1.33C MXene
-
MAXenes
- 3D Quantum Crystals
- MBene 2D Transition Metal Borides
-
Other 2D Products
- 2D Carbon-Based
-
2D Material Fiber/Film
- 3D Graphene Powder Series
- Boron Nitride Material
- Boron Nitride Nano Series
- Electrospun Carbon Nanofiber Series
- Electrospun Inorganic Nanofibers Series
- Electrospun Nanofiber Membrane Series
- Electrospun Polymer Nanofiber Membrane
- Electrospun SiC Nanofiber Membrane
- Lithium Ion/Fuel Cell Series
- Porous Metal Film Series
- Surface Graphene Structure Carbon Material Series
- Vertical Graphene Composite Carbon Material
- High Performance Battery Materials
- Other Liquid Products
- Other Powder/Crystal Products
- Perovskite Materials
- Porous materials MOF, COF
MoS2 FET

Description
Features And Benefits
Application
Specifications
Appearance | Transparent |
Characterization Methods | EDS, XRD, Raman, electrical output, transfer curve test |
Composition | MoS2 |
Layers | Single-layer, few-layer, multi-layer, single crystal |
Packaging | 1 piece/pack |
Production Method | Mechanical peeling/chemical vapor deposition (CVD) |
Specification | Mechanical lift-off single-layer MoS2 back-gate FET (single-layer, 5um wide channel, 300nm silicon oxide substrate) Mechanical lift-off few-layer MoS2 back-gate FET (~3 layers, 5um wide channel, 300nm silicon oxide substrate) Mechanical lift-off multilayer MoS2 back-gate FET (~5 layers, 5um wide channel, 300nm silicon oxide substrate) CVD triangular MoS2 single crystal back gate FET (single layer, 5um wide channel, 300nm silicon oxide wafer) |
Storage Conditions | Room temperature and dry |
Substrate | Silicon oxide |
Thickness | 300 nm SiO2 |
Type | Synthetic |
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