2D Materials / Alfa Chemistry
Electron Beam Evaporation System

Electron Beam Evaporation System

The electron beam evaporation system (E-beam evaporation) is a highly sophisticated thin film deposition technique, widely used in the fabrication of materials for various high-tech applications. Unlike traditional thermal evaporation, this method uses a focused electron beam to vaporize materials, allowing for precise control over the deposition process. The electron beam's high energy enables it to heat materials to the required vaporization temperatures, which is particularly beneficial for materials that require higher processing temperatures or those that are difficult to evaporate using conventional thermal methods.

Applications

The electron beam evaporation system offers two modes of operation: electron beam evaporation and thermal evaporation. These modes are primarily utilized for the deposition of thin films made of materials such as:

  • Metals: Titanium (Ti), Chromium (Cr), Nickel (Ni), Silver (Ag), Aluminum (Al), Gold (Au), and others.
  • Alloys: Specifically, the system is also used for alloying materials such as Ge-AuBe (Gold-Beryllium-Ge Alloy), AuGeNi (Gold-Germanium-Nickel Alloy), and others.

Technical Specifications

  • Sample Size: Standard substrates: 8" wafers and smaller.
  • Temperature: Heat up to 350°C.
  • Ultimate Vacuum: The system achieves a vacuum level of 5E-5 Pa.
  • Evaporation Rate: The deposition rate is adjustable from 0.1 Å/s to 10 Å/s.
  • Film Thickness Uniformity: ±5% for 500 nm thickness
  • Processing Capacity:
    2-inch wafers: 80 pieces per furnace.
    3-inch wafers: 16 pieces per furnace.
    4-inch wafers: 20 pieces per furnace.
    6-inch wafers: 9 pieces per furnace.
    8-inch wafers: 6 pieces per furnace.

Utilizing high-precision electron beam technology, our electron beam evaporation system technology platform allows for the deposition of metal, alloy, and semiconductor films with exceptional control over thickness, purity, and uniformity. Ideal for applications in semiconductor manufacturing, optical coatings, thin-film solar cells, and advanced materials research, our system operates in a high vacuum environment to ensure contamination-free coatings. For more services, please feel free to contact us.

Our Advantages

High Quality

High Quality

Time-Effective

Time-Effective

Hassle-Free

Hassle-Free

Time-Effective

Time-Effective

Alfa Chemistry provides cost effective, high quality and hassle free services to our clients worldwide. We guarantee on-time delivery of our results.

If you have any questions at any time during this process, please contact us. We will do our best to meet your needs.

Please kindly note that our products are for research use only.