2D Materials / Alfa Chemistry
2D Material Plasma Modification Service
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2D Material Plasma Modification Service

Two-dimensional (2D) materials with superior electrical, mechanical, thermal, and optical properties have been a popular study topic in recent years. The growth and post-growth modification processes are intimately linked to the characteristics of 2D materials. Alfa Chemistry is committed to bringing new dimensions to 2D materials using innovative synthesis and modification procedures in order to attain desired customized features. Plasma is an important technology we use for the synthesis and modification of 2D materials because of the unique plasma-material interactions that allow for effective energy transfer at the nanoscale.

We are able to provide plasma modification services for 2D materials to our customers, which will speed up their implementation in a number of applications. We've employed non-equilibrium and non-thermal plasma technologies to make graphene, silicene, germanene, phosphorene, hexagonal boron nitride (h-BN), and transition metal disulfides, among other 2D materials. Functionalization, doping, and etching are some of the plasma-assisted synthesis and modification methods we use.

Learn About Plasma

Plasma is the fourth state of matter and is made up of electrons, ions, neutrals, excitons, free radicals, and excited molecules that are created at low or atmospheric pressure. Because these plasma substances are more reactive than ground state atoms or molecules, they have a lot of potential for synthesizing and modifying nanomaterials in a low-energy and low-cost manner.

Learn About Plasma

In terms of low-temperature and quick synthesis, plasma-enhanced chemical vapor deposition (PECVD) outperforms other approaches such as mechanical stripping, liquid phase stripping, and thermal CVD. Controlling plasma confinement, plasma energy, gaseous precursors, and ion energy distribution to the material and surface allows for a high degree of morphology and structural homogeneity in both top-down and bottom-up approaches for manufacturing 2D materials.

Furthermore, plasma offers the opportunity to process 2D materials that are far beyond the growth of novel nanomaterial structures. Chemical functionalization, heteroatom doping, band gap tuning, etching, and surface wettability control are all possible using plasma-assisted changes. These procedures are made feasible by the presence of specific chemicals in the plasma, which allow for reactions that would be difficult to produce using traditional thermal or solution-based treatments. Furthermore, plasma modification can be done in situ (during nanomaterial synthesis) or non-in situ (during post-synthesis activities). As a result, plasma is a simple, effective, and frequently used process for changing and improving the structure and properties of 2D materials to better fulfill the needs of modern industry.

Our Modification Capabilities

Our Modification Capabilities

  • We use plasma technology to produce modified graphene materials with a wide range of properties caused by unique structures and morphologies, including N-, B-, P-, and O-heteroatom dopants, surface functionalization of H- and Cl-, n- and p-type doping, and surface hydrophilicity/hydrophobicity.
  • Plasma modification of 2D h-BN is the means we use to modify and control the material properties. The electronic characteristics of h-BN nanosheets have been altered by ectopic H2 plasma therapy and C doping by ectopic CH4 plasma treatment, both of which induce a transition from insulator to semiconductor. Air plasma treatment is also our method to control the surface wettability of vertically aligned BN nanosheets, achieving a dramatic change from superhydrophobic to superhydrophilic with increasing hydroxyl functionalization.
  • Due to its uniquely controllable, effective process and energy efficiency, we have used plasma treatment for a wide range of modifications of nanoscale 2D TMDC materials.

For more 2D material plasma modification services, please contact us quickly.

References

  1. Park J. B, et al. (2011). "Fast Growth of Graphene Patterns by Laser Direct Writing." Appl. Phys. Lett. 98: 173108.
  2. Qian M, et al. (2011). "Formation of Graphene Sheets through Laser Exfoliation of Highly Ordered Pyrolytic Graphite." Appl. Phys. Lett. 98: 173108.

Our Advantages

High Quality

High Quality

Cost-Effective

Cost-Effective

Hassle-Free

Hassle-Free

Cost-Effective

Cost-Effective

Alfa Chemistry provides cost effective, high quality and hassle free services to our clients worldwide. We guarantee on-time delivery of our results.

If you have any questions at any time during this process, please contact us. We will do our best to meet your needs.

Please kindly note that our products are for research use only.