UV-Assisted Etching of Multilayer Mo2CTx

UV-Assisted Etching of Multilayer Mo2CTx

Catalog Number: ACM12069895-5

CAS Number: 12069-89-5

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Description

Description The MXene exhibits a unique 2D graphene-like structure and high purity. When used as a negative electrode material for rechargeable batteries, it exhibits outstanding rate performance and cycle stability.
Furthermore, the flexible Mo2CMXene-based batteries have outstanding capacity retention rates (89% and 74%).

Features And Benefits

Features And Benefits High purity and excellent electrochemical performance

Application

Application This MXene shows great potential in ion storage applications.

Specifications

Molecular Weight	203.89 g/mol
Melting Point	2690 °C (4874 °F)
Purity	0.99
Density	9.18 g/cm3
Appearance	gray powder
Characterization Methods	TEM, XPS, SIMS, Raman, and XRD
Dimension	1-5um
Etching	The novel UV-assisted selective etching method can etch Ga atoms in the Mo2Ga2C precursor to obtain fluorine-free Mo2C MXene, and avoid the use of toxic and highly corrosive acids.
Functional Group	-OH, -F, -O, -Cl (can be customized)
Layers	10-20 layers
Packaging	0.5g, 1g, 2g
Production Method	freeze drying
Storage Conditions	Dry at room temperature
Type	Synthetic

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