ReSe2 Thin Film

ReSe2 Thin Film

Catalog Number: ACM12038641-2

CAS Number: 12038-64-1

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Description

Description Alfa Chemistry offers boron nitride films on different substrates.

Features And Benefits

Features And Benefits High purity and excellent electrochemical properties

Application

Application The ruthenium disulfide film produced by our company is deposited by chemical vapor deposition (CVD) on a variety of substrates, such as silicon oxide wafers, optical sapphire wafers and the like.

Specifications

Purity	99.9999% (6N)
Appearance	colorless and transparent
Characterization Methods	Raman, photoluminescence, TEM, EDS
Dimension	10mm*10mm
Layers	single-layer, double-layer and multi-layer
Packaging	1 piece/pack
Production Method	chemical vapor deposition (CVD)
Storage Conditions	Room temperature and dry
Substrate	Sapphire Substrate, PET Substrate, Quartz Substrate, SiO2/Si Substrate
Type	Synthetic

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Our Advantages

High Quality

Cost-Effective

Hassle-Free

Cost-Effective

Alfa Chemistry provides cost effective, high quality and hassle free services to our clients worldwide. We guarantee on-time delivery of our results.

If you have any questions at any time during this process, please contact us. We will do our best to meet your needs.

Please kindly note that our products are for research use only.