Mechanically Exfoliated Monolayer WS2 On Substrates

Description

Description Mechanically exfoliated monolayer WS2 is a promising member of Alfa Chemistry's family of 2D graphene-like materials. Among 2D materials with tailored morphologies aimed at enhancing their performance in nanoelectronics, WS2 is a particularly promising candidate. Alfa Chemistry's high quality WS2 layer films can be used as CVD grown films on sapphire, Al2O3 or SiO2 substrates.
Whatever your purpose, you'll be impressed with the performance and consistent quality of our mechanically peeled monolayer WS2.

Features And Benefits

Features And Benefits The WS2 monolayer films exhibit excellent optical properties, manifested in outstanding linewidths and photoluminescence quantum yields. In addition, WS2 monolayer films exhibit large spin-orbit coupling and large valence band splitting, leading many researchers to believe that WS2 monolayer films may exhibit excellent band-edge spin splitting, strong valley Hall effect, and optoelectronic desired magnetic field effect.

Application

Application Potential applications include transistors, sensors, and other electronic and photovoltaic devices.

Specifications

Molecular Weight	247.98 g/mol
Canonical SMILES	S=[W]=S
InChI	InChI=1S/2S.W
InChI Key	ITRNXVSDJBHYNJ-UHFFFAOYSA-N
Boiling Point	1250 °C (2280 °F; 1520 K)
Purity	(6N) 99.9999% confirmed
Appearance	Transparent
Bandgap	~2.05 eV
Characterization Methods	XRD, XPS, AES, SIM, and HRTEM
Coverage Area	>10 µm²
Dimension	10 mm*10 mm
Layers	single layer
Packaging	1 piece
Production Method	Mechanical exfoliation method
Storage Conditions	Room temperature and dry
Substrate	SiO2/Al2O3/Sapphire
Type	Synthetic