Mechanically Exfoliated Monolayer MoSe2 on Substrates

Mechanically Exfoliated Monolayer MoSe2 on Substrates

Catalog Number: ACMA00024995

CAS Number:

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Description

Description Alfa Chemistry's high quality MoSe2 layer films can be used as growth films on sapphire, Al2O3 or SiO2 substrates. Whatever your purpose, you'll be impressed with the performance and consistent quality of our mechanical exfoliation method single-layer WS2.

Features And Benefits

Features And Benefits Like most transition metal dichalcogenides and graphite, molybdenum diselenide (MoSe2) has a two-dimensional layered structure-the layers are stacked together through weak van der Waals interactions. Due to the larger size and better conductivity of selenium than sulfur, MoSe2 is one of the best TMDCs for metallic properties. This also provides an excellent opportunity to carry counter ions in electrochemical energy storage systems such as Li-ion and Na-ion batteries.

Application

Application Monolayer molybdenum disulfide (MoS2) has become a promising building block in optoelectronics for its high photosensitivity.

Specifications

Molecular Weight	253.86 g/mol
Canonical SMILES	[Se]=[Mo]=[Se]
Boiling Point	>1200 °C
Purity	(6N) 99.9999% confirmed
Appearance	Transparent
Bandgap	~1.5 eV
Characterization Methods	XRD, XPS, AES, SIM, and HRTEM
Coverage Area	>10 µm2
Dimension	10 mm*10 mm
Packaging	1 piece
Production Method	Mechanical exfoliation method
Storage Conditions	Room temperature and dry
Substrate	SiO2/Al2O3/Sapphire

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