CVD WSe2 Continuous Film

CVD WSe2 Continuous Film

Catalog Number: ACM12067468-8

CAS Number: 12067-46-8

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Description

Description The WSe2 film is a single-layer continuous film or a multi-layer WS2 continuous film in which triangular grains continue to grow together. WS2 has a variety of optional substrates, of which the sapphire substrate is a direct deposition product. Other substrates such as: SiO2/Si, silicon wafer, PET, PI, ITO, FTO, glass, metal substrate, etc., are transferred to the substrate required by customers by growing on sapphire.

Features And Benefits

Features And Benefits High purity and excellent electrochemical properties

Application

Application Optoelectronic devices, microelectronic devices, biological sensing, chemical sensing and other fields.

Specifications

Purity	99.9999% (6N)
Appearance	colorless and transparent
Characterization Methods	Raman, photoluminescence, TEM, EDS
Crystal Structure And Type	Hexagonal
Dimension	10*10mm, 15*15mm, 20*20mm, 2 inch disc, 4 inch disc or customized size specified by the customer.
Layers	single layer, multiple layers
Packaging	Purified vacuum packaging, 1 piece/box, 5 pieces/box. 10 pieces/box.
Production Method	Chemical Vapor Deposition (CVD)
Storage Conditions	Room temperature and dry
Substrate	TEM copper mesh, GaAs gallium arsenide, copper film, silver film, gold film, ITO, glass, SrTiO3 strontium titanate, mica, PDMS, SOI, high resistance intrinsic silicon (>10000ohm.cm) special for terahertz, silicon wafer , Flexible PET, Optical Quartz, Sapphire (Single/Double Polished), SiO2/Si
Thickness	Substrate 300nm oxide layer/other thickness (SiO2/Si)
Type	Synthetic

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