Custom TMDC Growth

Alfa Chemistry can grow high-quality TMDC layers with high mobility and good lattice orientation control on customer-specified growth substrates using CVD, MOCVD, and ALD technologies, and we can develop a variety of semiconductor TMDC monolayers such as MoS₂, WS₂, MoSe₂, and WSe₂ using CVD, MOCVD, and ALD technologies.

TMDC Growth Methods

For bottom-up synthesis of TMDC, CVD is the most prevalent and reliable approach. Alfa Chemistry has successfully grown TMDC films from solid-phase precursors such as MoS₂, WS₂, MoSe₂, WSe₂, MoTe₂, and ReS₂. Sulfur and metal oxide powders are the most common solid-phase precursors. In a reaction tube furnace, the precursors and substrate are connected in a line. TMDC flakes with a well-controlled thickness and good electrical characteristics are produced on the substrate in this manner. Furthermore, the spatial and dimensional uniformity of TMDC flakes can be improved by pretreatment of the substrate.

Fig 1. (a) Chemical synthesis of TMDC films. (a) Optical image; (b) high-resolution scanning transmission electron microscopy (STEM) image and (c) dark-field transmission electron microscopy (DF-TEM) image of CVD-grown MoS₂ monolayer on SiO₂/Si substrate. (Zande V, et al. ₂013)

For TMDC synthesis, we also adopt CVD "two-step" growth. A layer of transition metal or its related oxide is often deposited on the substrate, followed by sulfidation, selenization, or other high-temperature treatment.

We develop films with good mechanical strength and film continuity using metal organic chemical vapor deposition (MOCVD).

ALD (atomic layer deposition) is another option for TMDC films. In wafer-level TMDC films, sulfide metal oxide films made by ALD have recently been reported to have superior step coverage and more accurate thickness control. It is possible to avoid spatially inhomogeneous mixing of monolayers, multilayers, and non-deposited regions on the wafer.

Alfa Chemistry Growth Services

We can grow TMDC on a variety of substrates, including single-crystal thin films and continuous films, to meet your specific needs. Our services include the creation of alloyed TMDC materials such as MoSxSe2-x, WxMo1-xS, as well as doped 2D TMDC materials. We also offer basic Raman, PL, and AFM characterization of the resultant materials. More sophisticated characterization techniques, including XPS, FIB, STEM, or other techniques of the customer's choice, are available for an additional fee.

Procedure: Customers can obtain a quote by sending an email or filling out an inquiry form. We will engage with the customer extensively in order to fully comprehend their expectations and demands, and we will provide a trial of custom growth to see if the customer's substrate can grow. We will not request money if we find that growth is not achievable.

The cost of custom growth is determined by the task's intricacy. We guarantee the quality of the transfer and will refund your money if you are not happy.

Reference

1. Zande V, et al. (2013). "Grains and Grain Boundaries in Highly Crystalline Monolayer Molybdenum Disulphide." Nat. Mater. 12: 554-561.

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Alfa Chemistry provides cost effective, high quality and hassle free services to our clients worldwide. We guarantee on-time delivery of our results.

If you have any questions at any time during this process, please contact us. We will do our best to meet your needs.