Two-dimensional transition metal disulfides (2D TMDs), such as molybdenum disulfide (MoS2) and tungsten disulfide, have piqued interest due to their unusual structural, electrical, mechanical, and thermal properties, and are employed in a wide range of applications from optoelectronics to sensors (WS2). Because we are pioneers in the research synthesis of 2D materials, Alfa Chemistry can provide unique TMD material synthesis services to customers such as the world's leading R&D labs and universities.
Our approach for producing 2D TMD materials in a homogeneous and regulated manner has gotten a lot of interest. You can handle all of your 2D TMDs demands here, thanks to our superior technological processes and cheap price. We are proud to provide tools that will shape the future.
Properties of TMDs
2D TMDs consist of monolayers bound together by van der Waals gravity. It is useful for loading huge numbers of biomolecules because to its ultrathin structure and high surface area to mass ratio. TMDs in bulk have an indirect gap, whereas in monolayer they have a direct gap. The direct band gaps and electron mobility of MoSe2, MoS2, WSe2, WS2, and MoTe2 monolayers are equivalent to those of silicon, allowing them to be used in transistor manufacturing.
Fig 1. (a) Photograph of MoS2 film deposited on 4 inch wafer-scale polyamide substrate. (b) Schematic of direct synthesis process of MoS2 film on polyamide substrate. (Zhao J. H, et al. 2018)
TMDs have the ability to absorb up to 20% of incident light in a monolayer, so TMDs monolayers appear to be appealing optoelectronic materials. Photothermal therapy and biomedical imaging could benefit from 2D TMDs with high photothermal conversion coefficients.
Alfa Chemistry's Capabilities
Chemical stripping can be used by Alfa Chemistry to create ultra-thin 2D TMDs without the use of toxic organic solvents. Chemical vapor deposition (CVD) is another method for synthesizing TMDs, and CVD development of TMDs is commonly performed by heating reaction precursors in a furnace. At high temperature and pressure, the reaction precursors are exposed to the substrate. With this method, ultrathin 2D TMDs nanosheets with high electrical characteristics and crystal clarity are produced.
Alfa Chemistry has recently been able to use a low temperature PECVD technique to produce MoS2 films with wide areas, homogeneous atomic layers, and few atomic layers directly on diverse substrates as desired by clients. We used a low synthesis temperature of 150°C, allowing MoS2 to be grown on a variety of substrates, including flexible polymers. Our creation of few-layer MoS2 on SiO2 dielectric substrates in a PECVD method at 150 to 300 °C is an example. We also use low-power RF plasma treatment to thin MoS2 films by controlled plasma to monolayers with high homogeneity.
Our plasma-assisted synthesis of WS2 is also characterized by low temperature and fast sulfation. In an ICP plasma procedure, for example, WO3 films were treated with H2S plasma and vulcanized at low temperatures of 500 ℃. Similarly, we were able to successfully vulcanize WO3 to WS2 using low-power H2S plasma.
TMDs have a large surface-to-volume ratio as two-dimensional materials, allowing for effective surface chemical functionalization, and Alfa Chemistry can provide surface modification services for TMDs. To alter the material properties without considerably raising the weight or modifying the shape of the TMDs sheet, we apply a number of specialized and unique surface modification technology approaches.
Our technical services for TMDs include, but are not limited to, the following, so please continue to browse.
- Custom TMDC Growth
- Custom TMDC Transfer
Reference
- Zhao J. H, et al. (2018). "Recent Progress in Plasma-Assisted Synthesis and Modification of 2D Materials." 2D Mater. 5: 032002.
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